Pattern exposing apparatus

Photocopying – Projection printing and copying cameras – Identifying – composing – or selecting

Patent

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Details

355 77, 355 53, G03B 2752

Patent

active

044771827

ABSTRACT:
A pattern exposing apparatus comprising means for projecting a semiconductor device mask pattern onto the photoresist layer coated on a semiconductor substrate, and means for projecting an identification mark which is specific to each substrate onto a part of the photoresist layer.

REFERENCES:
patent: 3844655 (1974-10-01), Johannsmeier
patent: 4093370 (1978-06-01), Frech
patent: 4343877 (1982-08-01), Chiang

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