Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...
Patent
1977-08-22
1980-01-08
Rotman, Alan L.
Organic compounds -- part of the class 532-570 series
Organic compounds
Heterocyclic carbon compounds containing a hetero ring...
26032611R, 2603265CA, 2603403, 424267, 544148, 544364, 544378, C07D49308
Patent
active
041828895
ABSTRACT:
A process for preparing 10-methyl-2,9-dioxatricyclo[4,3,1,0.sup.3,7 ] decane derivatives is disclosed, wherein a 10-methylen-3-iodomethyl compound of the formula ##STR1## is hydrogenated to obtain a mixture of the corresponding epimeric 10.beta.- and 10.alpha.-methyl-3-iodomethyl compounds, the pure 10.alpha.- and 10.beta.-methyl epimers are separated and recovered from this mixture and are reacted with a secondary amine. Optionally, the substituent in the 4-position of the resulting 10.alpha.- or 10.beta.-methyl-3-aminomethyl compounds are further changed.
REFERENCES:
patent: 3812154 (1974-05-01), Thies
Chemical Abstracts, 80: 133654q (1974) [German Offen. 2,340,160; Bernauer et al., 2/21/74].
House, H., Modern Synthetic Reactions, 2nd. Ed., W. A. Benjamin, Inc., Menlo Park, Cal., 1972, p. 31.
Migrdichian, V., Organic Synthesis, vol. 1, Reinhold Pub. Corp., New York, 1957, p. 465.
March, J., Advanced Organic Chemistry, McGraw Hill, New York, 1968, pp. 591-592.
Schroter, R., in Newer Methods of Preparative Organic Chemistry, Interscience, New York, 1948, p. 92.
Asai Akiji
Ban Ivan
David Samuel
Thies Peter W.
Kali-Chemie Pharma GmbH
Rotman Alan L.
Schwartz Richard A.
LandOfFree
Process for preparing 10-methyl-2,9-dioxatricyclo[4,3,1,0.sup.3, does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for preparing 10-methyl-2,9-dioxatricyclo[4,3,1,0.sup.3,, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing 10-methyl-2,9-dioxatricyclo[4,3,1,0.sup.3, will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1941494