Coating process with voltammetric sensing of the coating solutio

Metal treatment – Compositions – Heat treating

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148 615Z, 427 8, 427345, 427436, 118690, 204 1T, C23F 710, C23C 300

Patent

active

041826388

ABSTRACT:
The effective concentration of an electroactive ingredient of a coating solution is determined, and may be restored to a desired level, in response to deviations in the voltammetric current sensed at an indicating electrode comprised of a noble metal.

REFERENCES:
patent: 2805191 (1957-09-01), Hersch
patent: 2864750 (1958-12-01), Hughes et al.
patent: 2888640 (1959-05-01), Eckfeldt et al.
patent: 3025459 (1962-03-01), Eckfeldt et al.
patent: 3061773 (1962-10-01), Ellison et al.
patent: 3250689 (1966-05-01), Seyl
patent: 3329587 (1967-07-01), Steinbrecher et al.
patent: 3350284 (1967-10-01), Steinbrecher et al.
patent: 3369928 (1968-02-01), Arlow
patent: 3470465 (1969-09-01), Wuschke
patent: 3515094 (1970-06-01), McVey
patent: 3532519 (1970-10-01), Hirohata et al.
patent: 3934054 (1976-01-01), Schmeling
patent: 4089710 (1978-05-01), Cooke
Kirk-Othmer, Encyclopedia of Chemical Technology, 2nd Ed., 1965, vol. 7, p. 762.

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