Method of forming integrated CMP stopper and analog capacitor

Details Method of forming integrated CMP stopper and analog capacitor Method of forming integrated CMP stopper and analog capacitor

1996-09-25

1997-09-23

Tsai, Jey

Fishing, trapping, and vermin destroying

437919, 437225, 148DIG14, H01L 2170, H01L 2700

Patent

active

056704100

ABSTRACT:
An analog capacitor is formed as part of an integrated circuit, using normal manufacturing methods, and then the upper electrode of this capacitor is used as part of the end point detection scheme during chem.-mech. polishing (CMP). Said upper electrode is formed from polysilicon and as soon as its upper surface is exposed as a result of the CMP, the presence of silicon particles in the removed material is readily detected by one of several possible methods.

REFERENCES:
patent: 5173437 (1992-12-01), Chi
patent: 5312512 (1994-05-01), Allman et al.
patent: 5332684 (1994-07-01), Yamamichi et al.
patent: 5364811 (1994-11-01), Ajika et al.
patent: 5399518 (1995-03-01), Sim et al.
patent: 5456756 (1995-10-01), Ramaswami et al.

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