Plasma deposition apparatus for photoconductive drums

Details Plasma deposition apparatus for photoconductive drums Plasma deposition apparatus for photoconductive drums

1983-01-10

1984-08-21

Smith, John D.

Coating apparatus

With indicating, testing, inspecting, or measuring means

118723, 118730, 118725, 118900, 427 39, 118692, C23C 1308

Patent

active

044663803

ABSTRACT:
This invention is directed to an apparatus for preparing semiconducting and photoelectronic devices comprised of a first electrode means, a second counter electrode means, a receptacle means for the first electrode means and the second counter electrode means, a substrate means to be coated contained on the first electrode means, which substrate is in the form of a cylindrical member, and a gas inlet means, a gas exhaust means, wherein a silane gas is introduced into the receptacle in a crossflow direction, perpendicular to the axis of the cylindrical member.

REFERENCES:
patent: 3886896 (1975-06-01), Van Cakenberghe
patent: 4080281 (1978-03-01), Endo
patent: 4225222 (1980-09-01), Kempter
patent: 4265991 (1981-05-01), Hirai et al.
patent: 4282267 (1981-08-01), Kuyel
patent: 4394426 (1983-07-01), Shimizu et al.
Japanese Journal of Applied Physics, vol. 20, 1981, pp. 305-310, "Electrophotographic of RF Glow Discharge-Produced A Si:H Film".
Photographic Science & Engineering, vol. 26, No. 3, 5-6/82, p. 148, "Design of an Amorphous Silicon P/R for Electrophotography".
Journal of Non-Crystalline Solids, 35 & 36, pp. 773-778, "A-Si Thin Film as a P/R for Electrophotography".

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