Patent
1986-12-01
1987-12-01
Clawson, Jr., Joseph E.
357 4, 357 16, 357 15, 357 61, H01L 2980
Patent
active
047107880
ABSTRACT:
A modulation doped field effect transistor (MODFET) having an n-conductive channel. This channel is produced by a heterostructure formed on a silicon substrate and composed of a modulation doped Si.sub.1-x Ge.sub.x layer as well as an undoped Si layer.
REFERENCES:
patent: 3626257 (1971-12-01), Esaki et al.
patent: 3626328 (1971-12-01), Esaki et al.
patent: 3721583 (1973-03-01), Blakeslee
patent: 4088515 (1978-05-01), Blakeslee et al.
patent: 4529455 (1985-07-01), Bean et al.
patent: 4661829 (1987-04-01), Bean et al.
K. Kaede et al., "High Speed GaAs/AlGaAs . . . Structure," Appl. Phys. Lett., vol. 48 #16, Apr. 21, 1986 pp. 1096, 1097.
G. Dohler, "Doping Superlattices," J. Vac. Sci. Tech., vol. 16 #3, May/Jun. 1979, pp. 851-856.
T. P. Pearsali, "Germanium-Silicon Modulation-Doped p-Channel Field-Effect Transistor", Chemical Abstracts, vol. 103, Nov. 1985, p. 675.
H. M. Manasevit et al., "Electron Mobility Enhancement in Eptaxial Multilayer Si-Si.sub.1-x Ge.sub.x Alloy Films on(100)Si", Applied Physics Letters, vol. 41, Sep. 1982, pp. 464-466.
R. People et al., "Modulation Doping in Ge.sub.x Si.sub.1-x /Si Strained Layer Heterostructures", Applied Physics Letters, vol. 45, Dec. 1984, pp. 1231-1233.
T. P. Pearsall et al, "Ge.sub.x Si.sub.1-x Modulation Doped p-Channel Field Effect Transistor", Proc. 1st Intern. Symp. on Silicon MBE, vol. 85-7, May 1985, pp. 400-405.
Dambkes Heinrich
Herzog Hans-J.
Jorke Helmut
Clawson Jr. Joseph E.
Licentia Patent-Verwaltungs-GmbH
LandOfFree
Modulation doped field effect transistor with doped Si.sub.x Ge. does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Modulation doped field effect transistor with doped Si.sub.x Ge., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Modulation doped field effect transistor with doped Si.sub.x Ge. will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1934175