Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1991-12-12
1993-06-08
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430198, 427123, 3461351, 378 35, 428457, G03F 900
Patent
active
052178293
ABSTRACT:
A novel photomask structure and method of producing photomasks using a non-contacting spark-discharge recording apparatus. The recording constructions of the present invention comprise a conductive layer, a layer transparent to the radiation that will be used to expose the target photosensitive material and, optionally, a coating layer deposited over the metal layer.
REFERENCES:
patent: 2983220 (1961-05-01), Dalton et al.
patent: 3158506 (1961-09-01), Ellison
patent: 3283704 (1966-11-01), Dalton
patent: 3411948 (1968-11-01), Reis
patent: 3509088 (1966-09-01), Dalton
patent: 3934503 (1976-01-01), Kinney et al.
patent: 4082902 (1978-04-01), Suzuke et al.
patent: 4188880 (1980-02-01), Figov et al.
patent: 4291119 (1981-09-01), Kido et al.
patent: 4304806 (1981-12-01), Anderson et al.
patent: 4309495 (1982-01-01), Ernsberger
patent: 4376943 (1983-03-01), Bahr et al.
patent: 4383016 (1983-05-01), Postupack
patent: 4392143 (1983-07-01), Bahr et al.
patent: 4459604 (1984-07-01), Kudelski et al.
patent: 4550061 (1985-10-01), Sachdev et al.
patent: 4554562 (1985-11-01), Afzali-Ardakami et al.
patent: 4567490 (1986-01-01), Afzali-Ardakami et al.
patent: 4596733 (1986-06-01), Cohen et al.
patent: 4617579 (1986-10-01), Sachdev et al.
patent: 4622262 (1986-11-01), Cohen
patent: 4830909 (1989-05-01), Cohen et al.
patent: 4836106 (1989-06-01), Afzali-Ardakani et al.
patent: 4894279 (1990-01-01), Sachdev et al.
patent: 4911075 (1990-03-01), Lewis et al.
patent: 4915519 (1990-04-01), Afzali-Ardakani et al.
patent: 5023156 (1991-06-01), Takeuchi et al.
patent: 5084331 (1989-01-01), Afzali-Ardakani et al.
patent: 5091052 (1992-02-01), Nowak et al.
Kirk-Othmer, "Encyclopedia of Chemical Technology", 3rd Ed., vol. 10, pp. 216-227, 242 and 250-252, John Wiley & Sons, 1980.
Lewis Thomas E.
Nowak Michael T.
Bowers Jr. Charles L.
Neville Thomas R.
Presstek Inc.
LandOfFree
Method for producing photomasks does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for producing photomasks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing photomasks will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1932958