Method of producing a multi-stage amplifier device

Fishing – trapping – and vermin destroying

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437133, 437912, 148DIG72, H01L 2170

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active

053915127

ABSTRACT:
A multistage amplifier device including an amplifier at the first stage or each of active elements of amplifiers at plural stages containing the first stage and excluding the last stage which is formed of FETs 1a and 1b including a gate having a self-alignment structure, and amplifiers at the remaining subsequent stages which are formed of FETs 1c and 1d including a gate electrode on an operating layer sandwiched between source and drain high impurity density regions, one edge portion at a source side of the gate electrode being overlapped through an insulating layer with the source high impurity density region while the other edge portion at a drain side of the gate electrode does not expand to the drain high impurity density region.

REFERENCES:
patent: 4615102 (1986-10-01), Suzuki et al.
patent: 4635343 (1987-01-01), Kuroda
patent: 4791072 (1988-12-01), Kiehl
patent: 4830980 (1989-05-01), Hsieh
patent: 5041393 (1991-08-01), Ahrens et al.
patent: 5077231 (1991-12-01), Plumton et al.
patent: 5254492 (1993-10-01), Tserng et al.
Lehmann et al., "X-Band Monolithic Series Feedback LNA", IEEE Transactions On Microwave Theory And Techniques, vol. MTT-33, No. 12, Dec. 1985, pp. 1560-1566.

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