Rapid response vapor source

Details Rapid response vapor source Rapid response vapor source

1996-01-11

1996-09-24

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

C23C 1400

Patent

active

055587208

ABSTRACT:
The apparatus is a rapid response evaporator for material deposition in vapor. The structure is a vessel which is heated to a temperature just above the melting temperature of the liquid which it contains. Inserted into the heated liquid is a funnel shaped evaporator structure in which the vertical tube is a capillary structure to raise the heated liquid from the vessel. The upper diverging portion of the evaporator contains a porous capillary interior coating in contact with the capillary tube, and the exterior is independently heated. Because of the low thermal mass of the upper portion of the evaporator and the liquid in its capillary structure, it can respond to heat changes quickly enough to rapidly vary the rate of evaporation and the thickness of the deposited coating.

REFERENCES:
patent: 3572672 (1971-03-01), Harel
patent: 4125086 (1978-11-01), Vig
patent: 4412508 (1983-11-01), Ney
patent: 4698235 (1987-10-01), Anderson
patent: 4700660 (1987-10-01), Levchenko
patent: 4761300 (1988-08-01), Schacter
patent: 4876114 (1989-10-01), Phinney

Affiliated with

Also associated with

Rating

Rapid response vapor source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rapid response vapor source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rapid response vapor source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1926170