Process and apparatus for forming thin films

Details Process and apparatus for forming thin films Process and apparatus for forming thin films

1986-05-15

1987-08-25

Silverberg, Sam

Coating processes

Electrical product produced

Metallic compound coating

4272481, 4272552, 118300, 136260, 136264, B05D 512

Patent

active

046892478

ABSTRACT:
Process and apparatus are disclosed for forming excellent quality, large area thin films essentially without discontinuities and inhomogenuities, particularly for photovoltaic solar cells. The reactants are conducted past a heated substrate in a relatively thin gap, e.g., 0.030 inch, in a turbulent flow. In a specific embodiment, the reactants are contained in nebuli of an atomized solution, and the nebuli are sorted, preferably by gravity, prior to introduction thereof into the gap to prevent introduction of larger size nebuli into the reaction gap.

REFERENCES:
patent: Re29812 (1978-10-01), Jordan et al.
patent: 2486955 (1949-11-01), Langwill
patent: 2576289 (1951-11-01), Fink
patent: 2943957 (1960-07-01), Grattidge et al.
patent: 2959499 (1960-11-01), Herczog et al.
patent: 3048146 (1962-08-01), Coppola
patent: 3387607 (1968-06-01), Gauthier et al.
patent: 3407085 (1968-11-01), Kitaj et al.
patent: 3432330 (1969-03-01), Diefendorf
patent: 3432331 (1969-03-01), Braddy et al.
patent: 3436257 (1969-04-01), Myers
patent: 3486931 (1969-12-01), Dreyfus
patent: 3522075 (1970-07-01), Kiel
patent: 3702780 (1972-11-01), Withers
patent: 3840391 (1974-10-01), Spitz et al.
patent: 3852098 (1974-12-01), Bloss
patent: 3880633 (1975-04-01), Jordan et al.
patent: 4123244 (1978-10-01), Leclercq et al.
patent: 4125391 (1978-11-01), Van Laethem
patent: 4132357 (1979-01-01), Blackinton
patent: 4224355 (1979-09-01), Lampkin et al.
patent: 4240816 (1980-12-01), McMaster et al.
patent: 4260427 (1981-04-01), Fulop et al.
patent: 4327119 (1982-04-01), Lis et al.
patent: 4336285 (1982-01-01), Squillante
patent: 4397671 (1983-08-01), Vong

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