Exposure apparatus

Details Exposure apparatus Exposure apparatus

1986-02-07

1987-08-25

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Original moves continuously

G03B 2748, G03B 2750, G03B 2770

Patent

active

046889329

ABSTRACT:
An exposure apparatus for use in the manufacture of semiconductor devices, for transferring an integrated circuit pattern of a reticle onto a semiconductor wafer by use of a projection lens optical system. A portion of the pattern of the reticle is irradiated with a light beam, and the light beam is scanningly deflected so that the whole of the pattern of the reticle is scanned with the light beam, whereby the pattern of the reticle is transferred onto the wafer. For compensation of a curvature of field of the projection lens optical system, the wafer is displaced in the direction of an optical axis of the projection lens optical system in accordance with the position of scan, on the reticle, whereby a high resolving power is assured over the entire surface of the reticle pattern. This allows enlargement of the pattern area of the reticle.

REFERENCES:
patent: 3709602 (1973-01-01), Satomi

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