Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1985-08-08
1986-04-22
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430214, 430215, 430218, 430222, 430372, 430536, 430537, 430551, 430559, 430627, 430635, G03C 554, G03C 140, G03C 148, G03C 104
Patent
active
045842639
ABSTRACT:
A photographic light-sensitive material is described, comprising a support having thereon at least one combination of a silver halide photographic emulsion layer and associated therewith a dye-providing compound capable of imagewise forming a mobile dye as a result of imagewise light exposure and photographic development, said silver halide photographic emulsion layer or a layer containing said dye-providing compound having dispersed, in a hydrophilic colloid, a water-insoluble and organic solvent-soluble homopolymer or copolymer having as the main chain or a side chain thereof a repeating unit including a ##STR1## bond and a redox compound represented by formula (I) as combined paticles; ##STR2## wherein R represents a hydrogen atom; a substituted or unsubstituted alkyl group, aryl group, acylamino group, alkoxy group, aryloxy group, alkylthio group, arylthio group, carbamoyl group, acyl group, alkoxycarbonyl group, aryloxycarbonyl group, sulfamoyl group, alkylsulfonyl group, or arylsulfonyl group; a halogen atom; a carboxy group; or a sulfonyl group; two of X.sup.1, X.sup.2, X.sup.3, and X.sup.4 represents members selected from the group consisting of a hydroxy group or a sulfonamido group having 1 or more carbon atoms, and the other two thereof each represents a member selected from the atoms and groups as defined above for R; or R and X.sup.1 together form a carboncylic or heterocyclic group; and the total number of carbon atoms of R, X.sup.1, X.sup.2, X.sup.3, and X.sup.4 is sufficiently large to immobilize the redox compound in a hydrophilic colloid layer.
REFERENCES:
patent: 4366236 (1982-12-01), Takahashi
patent: 4447523 (1984-05-01), Ross et al.
patent: 4474874 (1984-10-01), Hirano et al.
patent: 4525451 (1985-06-01), Ohki et al.
patent: 4530899 (1985-07-01), Ohki et al.
"Photographic Processes and Products", Research Disclosure No. 15162, 11/1976, pp. 75-87.
Fuji Photo Film Co. , Ltd.
Schilling Richard L.
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