Boots – shoes – and leggings
Patent
1991-02-11
1993-10-12
Trans, Vincent N.
Boots, shoes, and leggings
364488, 2504923, 2504921, G06F 1560, G06F 1520
Patent
active
052531821
ABSTRACT:
A method and apparatus for converting design pattern data for a semiconductor integrated circuit device to an exposure data for use in an exposure apparatus. The pattern data includes a repetition data section corresponding to the repetition section and defining one or more repetitive pattern segments for the unit cells with an overlap between adjacent ones of repetitive pattern segments and a non-repetition data section corresponding to the non-repetition section. Repetition information specifying the repetitive pattern segment is first produced from the design pattern data, and a pattern segment repetition frame is determined on the basis of the repetition information. The pattern segment repetition frame defines a unit region selected from the repetitive pattern segment. A repetitive arrangement of the unit region without any overlap is equivalent to at least a portion of the repetition section. Data for one of the unit cells and those of unit cells which are adjacent the one unit cell are selected and developed on the basis of the repetition information and are pattern-processed to produce processed repetitive pattern segment data and that portion of the processed repetitive pattern segment data which lies within the pattern segment repetition frame is extracted to form a fundamental pattern segment data. The fundamental pattern segment data is repetitively used for drawing the repetition section.
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"A Concurrent Pattern Operation Algorithm for VLSI Mask data" by Kozawa et al, IEEE 18th DAC, Jun. 1981, pp. 563-570.
Hitachi , Ltd.
Trans Vincent N.
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