Phase shifting mask and process for forming

Details Phase shifting mask and process for forming Phase shifting mask and process for forming

1999-01-13

2000-05-30

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

06068951&

ABSTRACT:
A phase shifting mask can be used with exposure lights of two different wavelengths. The depth of the phase shifting layer is calculated and fabricated such that it shifts a first exposure light about 180.degree. and a second exposure light about 180.degree..

REFERENCES:
patent: 5308722 (1994-05-01), Nistler
patent: 5397664 (1995-03-01), Noelscher et al.
patent: 5457006 (1995-10-01), Hirokane et al.
patent: 5549995 (1996-08-01), Tanaka et al.
patent: 5670281 (1997-09-01), Dai

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