Method for production of polysilanes and polygermanes, and depos

Details Method for production of polysilanes and polygermanes, and depos Method for production of polysilanes and polygermanes, and depos

1986-07-15

1988-12-20

Page, Thurman K.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

417 37, 417 39, B05D 306

Patent

active

047924608

ABSTRACT:
A process is provided for forming high purity polysilanes or polygermanes by electric discharge wherein the monosilane or monogermane is provided in a gaseous mixture with a carrier gas at atmospheric pressure. The polysilanes or polygermanes produced at atmospheric pressure are further deposited by various means onto a substrate as hydrogenated amorphous silicon or germanium. The polysilane may also be used for the deposition of hydrogenated amorphous silicon alloys.

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