Electron beam exposure system and an apparatus for carrying out

Details Electron beam exposure system and an apparatus for carrying out Electron beam exposure system and an apparatus for carrying out

1980-12-05

1982-12-07

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

With target means

2504922, H01J 3700, H01J 326

Patent

active

043629423

ABSTRACT:
An electron beam exposure system for projecting an electron beam onto a medium placed on a continuously moving stage, comprises a correction memory storing correction data for at least one of a field curvature, an astigmatism, and a distortion which changes in accordance with a deflection amount of the electron beam. An amount of actual deflection of the electron beam is obtained from the difference between a position data of the medium and the beam deflection position data with the electron beam then being controlled by the corresponding correction data read from the correction memory according to the amount of beam deflection.

REFERENCES:
patent: 3699304 (1972-10-01), Baldwin et al.
patent: 3753034 (1973-08-01), Spicer
patent: 3922546 (1975-11-01), Livesay
patent: 4075488 (1978-02-01), Okayama et al.
patent: 4180738 (1979-12-01), Smith et al.

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