Tandem betatron

Details Tandem betatron Tandem betatron

1991-01-22

1992-04-07

Yusko, Donald J.

328233, H05H 1100

Patent

active

051031868

ABSTRACT:
Two betatrons are provided in tandem for alternately accelerating an electron beam to avoid the single flux swing limitation of conventional betatrons and to accelerate the electron beam to high energies. The electron beam is accelerated in a first betatron during a period of increasing magnetic flux. The eletron beam is extracted from the first betatron as a peak magnetic flux is reached and then injected into a second betatron at a time of minimum magnetic flux in the second betatron. The cycle may be repeated until the desired electron beam energy is obtained. In one embodiment, the second betatron is axially offset from the first betatron to provide for electron beam injection directly at the axial location of the beam orbit in the second betatron.

REFERENCES:
patent: 2697167 (1954-12-01), Kerst
patent: 2839680 (1958-06-01), Wideroe
patent: 4481475 (1974-11-01), Kapetanakos et al.
patent: 4577156 (1986-03-01), Kerst
M. Stanley Livingston et al., "The Betatron-Magnetic Induction Accelerator", Particle Accelerators, pp. 193-235, McGraw-Hill Book Company, New York, 1962.

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