Fine pattern forming process

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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Details

427 44, 427 96, 427259, 427264, 427265, 427379, 427387, 4274071, B05D 306

Patent

active

051026880

ABSTRACT:
A positive type fine resist pattern can be formed at a high sensitivity at a high precision by using, as a resist film for a di-layer resist, a mixture or alternating copolymer of a silicon-containing resin and a polysulfone.

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