Fluoropolymer thin film coatings and method of preparation by pl

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427 39, 528401, 528402, B05D 306, C08G 7324, C08G 6522

Patent

active

049389955

ABSTRACT:
The subject invention relates to a process for the deposition of an oxygen-containing high fluoropolymer thin film onto an approxpriate substrate comprising loading the substrate in an enclosed reactor; evacuating the reactor; charging the reactor with an inert carrier gas and an oxygen-containing fluorocarbon monomer feed gas; and plasma-polymerizing the feed gas such that a thin film of polymerized monomer is deposited onto the substrate.
The invention further relates to an insulation material comprising the fluoropolymer thin film recited above, a plasma polymerized thin film of an oxygen-containing fluoropolymer, and the use of a polymerization precursor monomer for such thin films that is an oxygen-containing fluorocarbon monomer.

REFERENCES:
patent: 3676350 (1972-07-01), Wright et al.
patent: 4264750 (1981-04-01), Amand et al.
patent: 4391843 (1983-07-01), Kaganowicz et al.
patent: 4404256 (1983-09-01), Amand et al.
patent: 4419404 (1983-12-01), Arai et al.
patent: 4421843 (1983-12-01), Hattori et al.
patent: 4737415 (1988-04-01), Ichijo et al.
patent: 4816334 (1989-03-01), Yokoyama et al.
patent: 4845268 (1989-07-01), Ohsaka et al.
R. D'Agostino et al., "Diagnostics and Decomposition Mechanism in Radio-Frequency Discharges of Fluorocarbons Utilized for Plasma Etching or Polymerization; Plasma Chemistry and Plasma Processing", 2, 213-231 (1982).
R. D'Agostino et al., "Mechanisms of Etching and Polymerization in Radio-Frequency Discharges of CF.sub.4 --H.sub.2, CF.sub.4 --C.sub.2 F.sub.4, C.sub.2 F.sub.6 --H.sub.2, C.sub.3 F.sub.8 --H.sub.2 ", J. Appl. Phys., 54, 1284-1288 (1983).
T. F. Retajczyk, Jr. et al., "Properties of Plasma-Deposited Films Using Elkylene and Fluoroethylenes as Starting Monomers", Materials Letters, 2, 23-26 (1983).
E. Kay et al., "Plasma Chemistry of Fluorocarbons as Related to Plasma Etching and Plasma Polymerization", Topics in Current Chemistry, 94, 1-40 (1980).
E. A. Truesdale et al., "The Effect of Added Hydrogen on the RF Discharge Chemistry of CF.sub.4, CF.sub.3 H, and C.sub.2 F.sub.6 ", J. Appl. Phys., 50, 6594-6599 (1979).
Masuoka et al., "Plasma Polymerization of Hexafluoroethane", J. Polymer Science, 20, 2633-2642 (1982).
D. J. Astell-Burt et al., "A Study of the Deposition of Polymeric Material onto Surfaces from Fluorocarbon RF Plasmas", Plasma Chemistry and Plasma Processing, 6, 417-427 (1986).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fluoropolymer thin film coatings and method of preparation by pl does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluoropolymer thin film coatings and method of preparation by pl, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluoropolymer thin film coatings and method of preparation by pl will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1889784

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.