Process for removing impurities from perfluorinated alkyl bromid

Organic compounds -- part of the class 532-570 series – Organic compounds – Halogen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

570178, 570179, 570180, C07C 1720, C07C 1738, C07C 1908

Patent

active

051753804

ABSTRACT:
Mixtures of perfluorinated alkyl bromides or alkylene dibromides containing perfluorinated iodine compounds are irradiated with electromagnetic radiation in the wavelength range from 230 to 500 nm and brought into contact, either during the irradiation or directly thereafter, with at least one of the following agents: active charcoal, certain finely divided metals, lower aliphatic alcohols, chlorine, bromine, oxygen, hydrogen peroxide, aqueous or alcoholic solutions of alkali metal compounds with certain inorganic anions or lower aliphatic alcohols. After removal of the agent and if appropriate distillation, products which contain less than 0.0005% by weight of iodine compounds and can be employed, for example, in the medical sector can be obtained.

REFERENCES:
patent: 4801763 (1989-01-01), Maul et al.
patent: 5051535 (1991-09-01), von Werner
patent: 5073651 (1991-12-01), Raab
patent: 5113026 (1992-05-01), Raab
Haszeldine, R. N., J. Chem. Soc.: pp. 3761-3768 (1953).
Huang, B., et al., Chem. Abs. 102:78304, No. 78312x (1985).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for removing impurities from perfluorinated alkyl bromid does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for removing impurities from perfluorinated alkyl bromid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing impurities from perfluorinated alkyl bromid will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1889189

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.