Coating apparatus – With heat exchange – drying – or non-coating gas or vapor... – With solid heat exchange means contacting work
Patent
1991-01-03
1992-02-25
Wityshyn, Michael
Coating apparatus
With heat exchange, drying, or non-coating gas or vapor...
With solid heat exchange means contacting work
118326, 239589, B05B 100, B05B 134
Patent
active
050903608
ABSTRACT:
There is disclosed an atomized thin film forming apparatus for forming a thin film by spouting an atomized source solution toward a heated substrate. A pair of inner wall surfaces defined at the upper portion of a film forming nozzle and disposed opposite to each other with respect to the longitudinal direction of a film forming chamber are restricted so as to gradually narrow in the interval therebetween toward a spouting opening in a smooth curve. Hence, it is possible to prevent a mist of the source solution atomized by the atomizer from being locally stagnant in the film forming nozzle and prevent a precipitate of the atomized source solution from growing. Consequently, the flow of the mist of the source solution is not hindered by the precipitation of the atomized source solution so that the thin film is formed over the surface of the substrate at a high uniformity for a long period of time.
REFERENCES:
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patent: 3378396 (1968-04-01), Zaromb
patent: 4783006 (1988-11-01), Hayashi et al.
patent: 4843770 (1989-07-01), Crane
Thin Solid Films, vol. 139, No. 2, 5/15/86, pp. 189-199, T. M. Ratcheva et al. "Properties of In.sub.2 O.sub.3 : Te Films Prepared by The Spraying Method".
Solar Energy Materials, vol. 17, No. 6, Oct. 1988, pp. 407-423, Hideyo Iida et al. "Sb-Doped SnO.sub.2 Films Deposited by the CMD (Chemical Mist Deposition) Method".
Iida Hideyo
Imai Mizuho
Sekiguchi Mikio
Shiba Nobuyasu
Friedman Charles K.
Taiyo Yuden Co. Ltd.
Wityshyn Michael
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