Sputtering target with ultra-fine, oriented grains and method of

Specialized metallurgical processes – compositions for use therei – Compositions – Consolidated metal powder compositions

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

75232, 75340, C22C 104, C22C 2100

Patent

active

057807558

ABSTRACT:
A sputtering target comprising a body of metal such as aluminum and its alloy with an ultrafine grain size and small second phase. Also described is a method for making an ultra-fine grain sputtering target comprising melting, atomizing, and depositing atomized metal to form a workpiece, and fabricating the workpiece to form a sputtering target. A method is also disclosed that includes the steps of extruding a workpiece through a die having contiguous, transverse inlet and outlet channels of substantially identical cross section, and fabricating the extruded article into a sputtering target. The extrusion may be performed several times, producing grain size of still smaller size and controlled grain texture.

REFERENCES:
patent: 4016738 (1977-04-01), Puchko et al.
patent: 4198283 (1980-04-01), Class et al.
patent: 4889772 (1989-12-01), Bergmann et al.
patent: 4961831 (1990-10-01), Bergmann et al.
patent: 4961832 (1990-10-01), Shagun et al.
patent: 4963239 (1990-10-01), Shimamura et al.
patent: 4963240 (1990-10-01), Fukasawa et al.
patent: 4964962 (1990-10-01), Nobutani et al.
patent: 4964968 (1990-10-01), Arita
patent: 4964969 (1990-10-01), Kusakabe et al.
patent: 4966676 (1990-10-01), Fukasawa et al.
patent: 4971674 (1990-11-01), Hata
patent: 5087297 (1992-02-01), Pouliquen
patent: 5400633 (1995-03-01), Segal et al.
patent: 5590389 (1996-12-01), Dunlop et al.
V.M. Segal, "Working of Metals By Simple Shear Deformation Process", pp. 403-406.
V.M. Segal, "The Metalworking Process To Advance Materials", pp. 88-89.
V.M. Segal, et al., "Thermomechanical Treatment of the Elinvar Alloy 44NKhMT Using Plain Shear", pp. 706-710.
V.M. Segal, et al., "Plastic Working of Metals By Simple Shear", pp. 99-105.
V.M. Segal, et al., "The Application of Equal Channel Angular Extrusion to Produce Extraordinary Properties in Advanced Metallic Materials", First International Conference on Processing Materials for Properties, The Minerals, Metals & Materials Society (1993), pp. 971-974.
V.M. Segal, et al., Simple Shear as a Metal Working Process for Advanced Materials Technology First International Conference on Processing Materials for Properties, The Minerals, Metals & Materials Society (1993), pp. 947-950.
N.J. Grant, "Recent Trends and Developments with Rapidly Solidified Materials", Metallurgical Transactions A, vol. 23A, Apr. 1992, pp. 1083-1093.
E. Lavernia, et al., "Structure and Properties of the Lithium Containing X2020 Aluminum Alloys Produced by Liquid Dynamic Compaction", Rapid Solid Material Processing International Conference (1986) pp. 29-43.
J. Dunlop, "Trip Report -PMP (Processing Materials for Properties) Conference", Nov. 1993, pp. 1-7.
File Metadex, pp. 1-16.
J. Yuan, "Update on Application of Equal Channel Angular Extrusion Method to Our Al Targets" Jan. 1994, pp. 1-8.
Search Report, (Segal V), Derwent Information Ltd., 1995 (12 pages).
Collective Official Gazette, Patents Issued Section, related to U.S. Patent No.s 3,107,787; 3,161,756; and 3,922,898 (5 pages).
*Paul S. Gilman, "Structurally Controlled Sputtering Targets", Semiconductor Fabtech, 1995 (5 pages).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Sputtering target with ultra-fine, oriented grains and method of does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sputtering target with ultra-fine, oriented grains and method of, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sputtering target with ultra-fine, oriented grains and method of will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1883791

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.