Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1997-01-30
1998-07-14
Dang, Thi
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
118723I, H05H 100
Patent
active
057798494
ABSTRACT:
A plasma reactor includes, a) an electrically insulative shell forming a reactor cavity, the reactor cavity having internal walls; b) inductive coils positioned externally of the cavity; and c) a capacitive coupling plate positioned externally of the cavity intermediate the cavity and inductive coils, a power source being operably connected with the capacitive coupling plate. A method of cleaning away material adhering to internal walls of a plasma reactor includes, a) injecting a cleaning gas into the reactor, the cleaning gas comprising a species which when ionized is reactive with material adhering to the internal plasma reactor walls; and b) generating a capacitive coupling effect between a pair of conductors, at least one of which is positioned externally of the plasma reactor, effective to both ionize the cleaning gas into the reactive ionized species and draw such ionized species in the direction of the external conductor to impact and clean away material adhering to the reactor internal walls. A combination dry etching and cleaning process is also disclosed.
REFERENCES:
patent: 3616461 (1971-10-01), Gorin
patent: 4486461 (1984-12-01), Ito et al.
patent: 4786352 (1988-11-01), Benzing
patent: 4786392 (1988-11-01), Kruchowski et al.
patent: 4795880 (1989-01-01), Hayes et al.
patent: 5234529 (1993-08-01), Johnson
patent: 5252178 (1993-10-01), Moslebi
patent: 5269881 (1993-12-01), Sekiya et al.
patent: 5277751 (1994-01-01), Ogle
patent: 5346578 (1994-09-01), Benzing et al.
patent: 5433812 (1995-07-01), Cuomo et al.
patent: 5449432 (1995-09-01), Hanawa
patent: 5523261 (1996-06-01), Sandhu
patent: 5647913 (1997-07-01), Blalock
Dang Thi
Micro)n Technology, Inc.
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