X-ray exposure apparatus

Details X-ray exposure apparatus X-ray exposure apparatus

1991-08-21

1992-06-30

Porta, David P.

X-ray or gamma ray systems or devices

Beam control

378 34, G21K 106

Patent

active

051270293

ABSTRACT:
An X-ray exposure apparatus includes an X-ray source; and a directing optical system for directing an X-ray beam from the X-ray source to a surface to be exposed, the directing optical system incuding a mirror having a reflection surface of a curvature radius R with respect to a predetermined sectional plane, for reflecting the X-ray beam and for expanding the diameter thereof with respect to the sectional plane; wherein the mirror satisfies the following conditions:

REFERENCES:
patent: 4631743 (1986-12-01), Tomimasu et al.
Golovchenko et al., "X-ray Monochromator system for use with synchroton radiation source", Rev. Sci. Instrum, 52(4), Apr. 1987, pp. 509-516.
Webb et al., "A Focussing Monochromator for Small Angle Diffraction Studies with Synchroton Radiation", J. Appl. Cryst, Apr. 1977, 10, 104-110.
Haelbich, "Optimization of the Optics Matching a Storage Ring to an X-Ray Lithography Camera", Proceedings of SPIE, vol. 448, Oct. 1983, pp. 93-101.
"Handbook on Synchrotron Radiation", vol. 1B, Chapter 13, pp. 1135-1136, North Holland Publishing Co., Amsterdam, Netherlands, 1983.

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