Phase shift mask and method for fabricating the same

Details Phase shift mask and method for fabricating the same Phase shift mask and method for fabricating the same

1997-06-24

1999-05-04

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059003375

ABSTRACT:
The phase shift mask and a method for fabricating the phase shift mask of the present invention improve a light intensity in a densely packed pattern. The phase shift mask has a light shielding layer with a plurality of light transmissive regions formed therein, including an etch stopper layer with first light transmissive patterns and second light transmissive patterns formed alternately thereon. Each of the first light transmissive patterns has one of the light transmissive regions and a first phase shift layer formed between the rims of one of the light transmissive regions, and each of the second light transmissive patterns has a second phase shift layer formed on a central part of another one of the light transmissive regions.

REFERENCES:
patent: 5300379 (1994-04-01), Dao et al.
patent: 5302477 (1994-04-01), Dao et al.
patent: 5460908 (1995-10-01), Reinberg
patent: 5472812 (1995-12-01), Sekine
Marc D. Levenson et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask," IEEE Transactions on Electron Devices, vol. ED29., No. 12, Dec. 1982.
Tsuneo Terasawa et al., "0.3-Micron Optical Lithography Using a Phase-Shifting Mask," SPIE, vol.1088, Optical/Laser Microlithography 11 (1989), pp. 25-26.

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