Method of fabricating a polysilicon thin film transistor

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 41, 437937, 437233, H01L 21336

Patent

active

055344453

ABSTRACT:
A process for producing a polysilicon thin film transistor includes hydrogenating the thin film transistor and depositing an atomic hydrogen-containing layer on the thin film transistor. The thin film transistor is characterized by leakage current rates as low as 10.sup.-13 A.

REFERENCES:
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4751196 (1988-06-01), Pennell et al.
patent: 4766477 (1988-08-01), Nakagawa et al.
patent: 4769338 (1988-09-01), Ovshinsky et al.
patent: 4851363 (1989-07-01), Troxell et al.
patent: 4857976 (1989-08-01), Overhauser et al.
patent: 4859617 (1989-08-01), Nomoto et al.
patent: 4866003 (1989-09-01), Yokoi et al.
patent: 4880753 (1989-11-01), Meakin et al.
patent: 4883766 (1989-11-01), Ishida et al.
patent: 4943837 (1990-07-01), Konishi et al.
patent: 5273910 (1993-12-01), Tran et al.
Ohshima, Negishi, Hayashi, Noguchi and Mizumuram "Sub-.mu.m Polysilicon Super Thin Film Transistor", IEDM 1986, pp. 196-199.
Hydrogenation for Polysilicon MOSFET's by Ion Shower Doping Technique by K. Setsune, M. Miyauchi and T. Hirao dated 1986.
Hu et al, "Deposition of Silicon Nitride by RF Sputtering in Ammonia and Argon Mixture", IBM Technical Disclosure Bulletin, vol. 10, No. 2, Jul. 1967, p. 100.
Matso et al., "Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma", Jap. J. of Appl. Physics, vol. 22, No. 4, Apr. 1983, pp. L210-L212.
Kamins, "Hydrogenation of Transistors Fabricated in Polycrystalline-Silicon Films", IEEE Electron Device Letters, vol. EDL-1, No. 8, pp. 159-161 (Aug. 1980).
Proano et al, "Fabrication and Properties of Single, Double and Triple Gate Polycrystalline-Silicon Thin Film Transistors", Proc. of Materials Research Society Symposium, vol. 106, pp. 317-322 (1988).
Unagami et al, "High-Performance Poly-Si TFT's with ECR-Plasma Hydrogen Passivation", IEEE Transaction on Electron Devices, vol. 36, No. 3, pp. 529-533 (Mar. 1989).
Pollack et al, "Hydrogen Passivation of Polysilicon MOSFET's From a Plasma Nitride Source", IEEE Electron Device Letters, vol. EDL-5, No. 11, pp. 468-470 (Nov. 1984).
Faughman et al, "A Study of Hydrogen Passivation of Grain Boundaries in Polysilicon Thin-Film Transistors", IEEE Transactions on Electron Devices, vol. 36, No. 1, pp. 101-107, (Jan. 1989).
Fritzsche, "Heterogeneities and Surface Effects in Glow Discharge Deposited Hydrogenated Amorphous Silicon Films", Thin Solid Films, vol. 90, pp. 119-129, (1982).
Biegelsen et al, "Hydrogen Evolution and Defect Creation in Amorphous Si:H Alloys", Physical Review B, vol. 20, No. 12, pp. 4839-4846 (Dec. 15, 1979).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of fabricating a polysilicon thin film transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating a polysilicon thin film transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating a polysilicon thin film transistor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1866879

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.