Ion beam sputter-etched ventricular catheter for hydrocephalus s

Details Ion beam sputter-etched ventricular catheter for hydrocephalus s Ion beam sputter-etched ventricular catheter for hydrocephalus s

1981-06-10

1983-03-22

Howell, Kyle L.

Surgery

Devices transferring fluids from within one area of body to...

604280, A61B 2700

Patent

active

043771696

ABSTRACT:
The ventricular catheter 10 of the present invention comprises a multiplicity of inlet microtubules 12. Each microtubule has both a large opening 16 at its inlet end and a multiplicity of microscopic openings 18 along its lateral surfaces.
The microtubules are perforated by a new and novel ion beam sputter etch technique. The holes are etched in each microtubule by directing an ion beam 20 through an electro formed metal mesh mask 28 producing perforations having diameters ranging from about 14 microns to about 150 microns.
This combination of a multiplicity of fluoropolymer microtubes, the numerous small holes provided in the lateral surfaces of the tubes, and the hydra-like distribution of the tubes provide a new and novel catheter. This structure assures a reliable means for shunting cerebrospinal fluid from the cerebral ventricles to selected areas of the body.

REFERENCES:
patent: 3410979 (1968-11-01), Larsson
patent: 3437088 (1969-04-01), Bielinski
patent: 3595241 (1971-07-01), Sheridan
patent: 3656988 (1972-04-01), Steffen et al.
patent: 3753439 (1973-08-01), Brugarolas et al.
patent: 3823720 (1974-07-01), Tribble
patent: 4038513 (1977-07-01), Steigerwald
patent: 4072153 (1978-02-01), Swartz
patent: 4083369 (1978-04-01), Sinnreich
patent: 4121595 (1978-10-01), Heitmann
patent: 4182343 (1980-01-01), Inaba
"A New Tissue Drain", W. Yeates, The Lancet, 12/1/62, p. 1150.

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