Light-sensitive polymer, method for preparing the same andmethod

Details Light-sensitive polymer, method for preparing the same andmethod Light-sensitive polymer, method for preparing the same andmethod

1990-12-03

1992-06-30

Marquis, Melvyn I.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

528 34, C08G 7700

Patent

active

051264196

ABSTRACT:
A polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds more than trisilane bonds, sensitive to far ultraviolet rays. The light-sensitive polymer can be prepared by copolymerizing a dichlorodisiloxane and a dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet and is suitable for preparing a single layered resist or an upper resist of a two layered resist system.

REFERENCES:
patent: 4384100 (1983-05-01), Takamizawa et al.
patent: 4626583 (1986-12-01), Arkles
patent: 4761464 (1988-08-01), Zeigler

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