Method for metal ion implantation using multiple pulsed arcs

Details Method for metal ion implantation using multiple pulsed arcs Method for metal ion implantation using multiple pulsed arcs

1990-09-05

1992-06-30

Lusignan, Michael

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 39, 427 37, 2504923, B05D 306

Patent

active

051261634

ABSTRACT:
A method and apparatus for implanting metal ions into the surface of a non-planar object. A pulsed arc source provides a plasma of high density metal ions to surround a target sample exclusively during a predetermined period in which an implanting voltage pulse is applied to the target sample. The pulsed arc source is subsequently interrupted slightly before termination of the implant voltage pulse such that each and every metal ion from the ion plasma is implanted into the target sample during a single implantation cycle. This process is cyclically repeated until a desired concentration of ions is implanted into the target sample.

REFERENCES:
patent: 4764394 (1988-08-01), Conrad
patent: 5013578 (1991-05-01), Brown et al.
"Transport of vacuum arc plasma through straight and curved magnetic ducts" J. Storer et al, J. Appl. Phys. 66 (11), Dec. 1, 1988, pp. 5245-5250.

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