Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

1996-06-13

2000-06-20

Epps, Georgia

Photocopying

Projection printing and copying cameras

Step and repeat

355 77, G03B 2768

Patent

active

060783818

ABSTRACT:
An exposure apparatus for transferring a pattern formed on a mask to a photo-sensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a scanning device for scanning synchronously the mask and the photosensitive substrate, and a device for setting a width of an exposure area in a scan direction of the photosensitive substrate conjugate with an illumination area on the mask with respect to the projection optical system, to integer times as large as a distance which the photosensitive substrate moves during an interval between pulse emissions from the light source.

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patent: 5361121 (1994-11-01), Hattori et al.
patent: 5473410 (1995-12-01), Nishi
patent: 5477304 (1995-12-01), Nishi
patent: 5591958 (1997-01-01), Nisihi et al.

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