Method of manufacturing a thin-film electroluminescent display e

Details Method of manufacturing a thin-film electroluminescent display e Method of manufacturing a thin-film electroluminescent display e

1988-09-15

1989-11-14

Bell, Janyce

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

204192D, 2041921, 427 39, 427 66, B05D 306, B05D 512, C23C 1400

Patent

active

048806617

ABSTRACT:
A thin-film EL element is manufactured by forming a silicon nitride or silicon oxynitride film for a first dielectric layer by sputtering and a silicon nitride or silicon oxynitride film for a second dielectric layer by plasma chemical vapor deposition so that the element's resistance against moisture and mass productivity can be improved.

REFERENCES:
patent: 4188565 (1980-02-01), Mizukami et al.
patent: 4481229 (1984-11-01), Suzuki et al.
patent: 4492716 (1985-01-01), Yamazaki
patent: 4496450 (1985-01-01), Hitosuyanagi et al.
patent: 4517733 (1985-05-01), Hamano
patent: 4525381 (1985-06-01), Tanaka et al.

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