Silver halide photographic light-sensitive material

Radiation imagery chemistry: process – composition – or product th – Silver halide colloid tanning process – composition – or product

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430570, G03C 110

Patent

active

057534101

ABSTRACT:
Disclosed is a silver halide photographic light-sensitive material comprising a support having thereon a light-sensitive silver halide emulsion layer and a layer adjacent to said light-sensitive silver halide emulsion layer, wherein

REFERENCES:
patent: 4978602 (1990-12-01), Fujita et al.
patent: 4988603 (1991-01-01), Takamuki et al.
patent: 4994345 (1991-02-01), Yoshizawa et al.
patent: 5004669 (1991-04-01), Yamada et al.
patent: 5026622 (1991-06-01), Yamada et al.
patent: 5085970 (1992-02-01), Kameoka et al.
patent: 5098820 (1992-03-01), McManus et al.
patent: 5200298 (1993-04-01), Takagi et al.
patent: 5236807 (1993-08-01), Inoue et al.
patent: 5238800 (1993-08-01), Hosoi et al.
patent: 5296343 (1994-03-01), Hioki et al.
patent: 5306598 (1994-04-01), Kolosick
patent: 5340694 (1994-08-01), Hioki et al.
patent: 5352563 (1994-10-01), Kawasaki et al.
patent: 5366845 (1994-11-01), Inoue et al.
patent: 5422224 (1995-06-01), Katoh
patent: 5424169 (1995-06-01), Ezoe et al.
patent: 5508153 (1996-04-01), Ishikawa et al.
Keller, Science and Technology of Photography, Chapter 2.2, pp. 13-25, 1993, Weinheim.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Silver halide photographic light-sensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silver halide photographic light-sensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silver halide photographic light-sensitive material will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1851529

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.