Process for the elimination of tungsten oxidation with inert gas

Details Process for the elimination of tungsten oxidation with inert gas Process for the elimination of tungsten oxidation with inert gas

1996-04-30

1998-05-19

Utech, Benjamin

Coating processes

Coating by vapor, gas, or smoke

427255, 4272553, 4272557, C23C 1640

Patent

active

057533032

ABSTRACT:
An inert gas, such as helium, nitrogen, or argon, is used for pressurization and stabilization in a chemical vapor deposition process that occurs in an ambient temperature in excess of 400.degree. C. Using the inert gas in the pressurization and stabilization stages of the chemical vapor deposition process eliminates the formation of tungsten oxides on tungsten studs, lines and other devices in the substrate, thereby eliminating the variable contact resistance and other problems associated with tungsten oxides.

REFERENCES:
patent: 4357179 (1982-11-01), Adams et al.
patent: 4513026 (1985-04-01), Miyamoto et al.
patent: 4619840 (1986-10-01), Goldman et al.
patent: 4726961 (1988-02-01), Diem et al.
patent: 4849260 (1989-07-01), Kusumoto et al.
patent: 4895770 (1990-01-01), Schintlmeister et al.
patent: 4994301 (1991-02-01), Kusumoto et al.
patent: 5254369 (1993-10-01), Arai et al.
patent: 5354387 (1994-10-01), Lee et al.
patent: 5387438 (1995-02-01), Werner et al.
patent: 5407698 (1995-04-01), Emesh

Affiliated with

Also associated with

Rating

Process for the elimination of tungsten oxidation with inert gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the elimination of tungsten oxidation with inert gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the elimination of tungsten oxidation with inert gas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1850768