Reagent supply vessel for chemical vapor deposition

Details Reagent supply vessel for chemical vapor deposition Reagent supply vessel for chemical vapor deposition

1997-12-17

2000-06-20

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118726, 222 61, 222 66, 2224647, C23C 1600, B67D 508, B67D 560

Patent

active

060773561

ABSTRACT:
A liquid reagent dispensing assembly, comprising a gas-pressurizable vessel including a floor, and an interior volume bounded by interior wall and floor surfaces. A dip-tube liquid discharge conduit is employed for discharging liquid from the gas-pressurized vessel. The vessel is provided with a liquid level sensor for sensing liquid reagent level in the vessel interior volume. The floor of the vessel has a cavity therein extending downwardly from the surface of the floor, and the lower end of the dip tube is positioned in the cavity. The dispensing assembly of the invention may usefully be employed for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices, and achieves a high level of withdrawal of the reagent liquid from the vessel.

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