Method of testing a phase shift mask and a testing apparatus use

Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer

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356354, 356345, 250372, G01B 902

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active

054265037

ABSTRACT:
A method and apparatus are provided for obtaining accurately an amount of phase shift and light transmittance in a phase shift mask by a phase shifting portion. A shearing type Mach-Zehnder interferometer is constructed using an optical member for ultraviolet light. Using light having a wavelength identical to that of light used in photolithography, light transmitted through a phase shifting portion interferes with light transmitted through a light transmitting portion, resulting in an interference light intensity signal. From the interference light intensity signal, an amount of phase shifting and light transmittance of the phase shifting portion can be obtained directly and non-destructively.

REFERENCES:
"New Phase Shifting Mask with Self-Aligned Phase Shfiters for a Quarter Micron Photolithography", Nitayama et al, IEDM 89, pp. 57-60.
"Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks", Terasawa et al, JJAP Series 5, pp. 3-9.
"Proceeding of 11th Meeting Japan Society for Laser Microscopy", Hyogo Prefectural Institute of Industrial research, Kobe, Japan, pp. 22-29.
"Interference Equipment for Transmitted-Light Microscopy", Beyer et al., Jena Review 10 (1965), pp. 99-105.
"Epival Interphako Incident-Light Interference Microscope", Beyer H. Jena Review 16, (1971), pp. 82-88.
"Problems Regarding a Micro Pattern Densitometer", Jun Koana, Transactions of the Society of Illumination 1942, pp. 371-385.

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