Vinyl halide polymer blends of enhanced impact resistance

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

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525 93, 525 96, C08L 5100, C08L 5300

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043190022

ABSTRACT:
A polymer blend capable of being molded to an impact resistant, substantially transparent or translucent article which comprises a vinyl halide homopolymer or copolymer, a conventional impact resistance enhancing polymer agent for polyvinyl halide wherein the monomer units consist essentially of methyl methacrylate, 1,3-butadiene and styrene residues and a thermoplastic block elastomer wherein the essential and predominant monomer units are the residue of a mono-alkenyl aromatic hydrocarbon and the residue of an alkadiene hydrocarbon. The thermoplastic elastomer is normally incompatible with the vinyl halide polymer or copolymer. The vinyl halide polymer or copolymer constitutes the major proportion of said blend and the block and methacrylate polymers together constitute a minor proportion of the composition. The weight ratio of block polymer to methacrylate polymer is about 1:5 to about 5:1.

REFERENCES:
patent: 3557252 (1971-01-01), Hsieh et al.
patent: 3825622 (1974-07-01), Robeson et al.
patent: 4161472 (1979-07-01), Lehr
"Encyclopedia of PVC", L.I. Nass (ed); vol. II; Marcel Dekker, Inc. New York & Basel.

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