Thermal print head, method of manufacturing the same and method

Details Thermal print head, method of manufacturing the same and method Thermal print head, method of manufacturing the same and method

1996-08-19

2000-05-23

Le, N.

Incremental printing of symbolic information

Thermal marking apparatus or processes

Specific resistance recording element type

347204, B41J 2335

Patent

active

060671041

ABSTRACT:
A polycrystalline layer is formed on a surface of a substrate and metal electrode layers are formed thereon to be opposed to each other. The polycrystalline silicon layer includes an exposed region exposed from the metal electrode layers, and this exposed region includes low resistance regions extending under the metal electrode layers to be in a pair, and a high resistance region having a high sheet resistance defined between the low resistance regions. At least one of the low resistance regions is so trimmed as to adjust heat generation from the high resistance region.

REFERENCES:
patent: 4532530 (1985-07-01), Hawkins
patent: 4935752 (1990-06-01), Hawkins
patent: 5055859 (1991-10-01), Wakabayashi et al.
patent: 5317341 (1994-05-01), Tatsumi
patent: 5483736 (1996-01-01), Ohnishi
patent: 5559543 (1996-09-01), Komuro

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