Nonvolatile semiconductor memory

Electrical transmission or interconnection systems – Nonlinear reactor systems – Parametrons

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357 13, 357 41, 357 54, 307238, H01L 2978, H01L 2702, H01L 2934, H03K 500

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active

041237714

ABSTRACT:
A nonvolatile semiconductor memory having an insulated gate field effect transistor whose structure is so made as to permit, during the write operation, a substrate surface region below the gate to be substantially enclosed by depletion layers extended from the source and drain regions or by said depletion layers and a channel formed between said regions, thereby increasing a resistance between the substrate and said substrate surface region to decrease the writing current in amount and the writing voltage in level.

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Terman "Floating Aualance-Injection Metal-Oxide Semiconductor Device with Low Write Voltage" IBM Tech. disclosure bulletin vol. 14(5/72)p. 3721.
Anantha et al., "Single Fet Memory Cell with Buried Extended Source" IBM Tech. Disclosure Bulletin vol. 16 (1/74) p. 2708-2709.

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