Method of information recording on a semiconductor wafer

Static information storage and retrieval – Radiant energy – Electron beam

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365114, 365237, G11C 1134, G11C 1142

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active

046725784

ABSTRACT:
An information recording method is provided, in which a p- or n-type semiconductor wafer is irradiated with an energetic particle beam such as an electron beam thereby to control, e.g., decreased or increased generation of the surface photovoltage at the irradiated area so that information may be recorded on the wafer.

REFERENCES:
patent: 3497698 (1970-02-01), Phelan et al.
patent: 3506971 (1970-04-01), Sakurai
patent: 3746867 (1973-07-01), Phelan et al.
patent: 4068218 (1978-01-01), Likuski
patent: 4103341 (1978-07-01), Brody
patent: 4126901 (1978-11-01), Brody
patent: 4144591 (1979-03-01), Brody
Japanese Journal of Applied Physics-vol. 21, No. 9, Sep. 1982; pp. L555-L557.

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