Positive photoresist composition

Details Positive photoresist composition Positive photoresist composition

1997-01-17

1997-11-04

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, G03F 7023

Patent

active

056838514

ABSTRACT:
Provided is a positive photoresist composition comprising (A) an alkali-soluble resin prepared by condensation of aldehydes and a mixture of phenols, which comprises (i) thymol, isothymol or a thymol-isothymol mixture and (ii) one or more of a phenol compound represented by the following formula (I); ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different, and each of them represents a hydrogen atom or a methyl group, and optionally, as a third monomer, (iii) a phenol compound other than m-cresol; (B) 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid esters as photosensitive agent; and (C) a low molecular weight compound having from 12 to 50 carbon atoms in all and from 2 to 8 phenolic hydroxy groups.

REFERENCES:
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patent: 5110706 (1992-05-01), Yumoto et al.
patent: 5225311 (1993-07-01), Nakano et al.
patent: 5322757 (1994-06-01), Ebersole et al.
patent: 5403696 (1995-04-01), Hioki et al.
patent: 5437952 (1995-08-01), Hirai et al.
patent: 5460917 (1995-10-01), Kobayashi et al.

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