Patent
1990-06-07
1992-02-18
Jackson, Jr., Jerome
357 4, 357 59, H01L 2978, H01L 2904
Patent
active
050898701
ABSTRACT:
An SOI MOS transistor comprises at least a highly doped lateral stripe (13, 14) of the same conductivity type as the substrate (3). This stripe extends along the edge of the substrate and of the source region (5) and is shorted with the source region through the conductive source layer (11).
REFERENCES:
patent: 4423432 (1983-12-01), Stewart
Jackson, Jr. Jerome
L'Etat Francais represente par le Ministre des Postes, des
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