Photocopying – Projection printing and copying cameras – Step and repeat
Patent
1994-10-07
1995-08-29
Gellner, Michael L.
Photocopying
Projection printing and copying cameras
Step and repeat
2504921, 356400, 378 34, 355125, G03B 2728
Patent
active
054465214
ABSTRACT:
An attenuated phase-shifted reticle is disclosed. The reticle comprises a device region and a scribeline region. The scribeline region further comprises metrology cells, which contain features to be patterned for the purpose of measurement, etc. Other portions of the scribeline region comprise a sub-resolution pattern of, for example, lines and spaces 180.degree. out of phase. Since the pattern is sub-resolution, it will not print. Since the pattern comprises features 180.degree. out of phase, the intensity of radiation underneath the pattern is significantly reduced. Therefore, in a lithography method incorporating multiple exposures of the scribeline region, the metrology cells are not overexposed by the overlapping exposures in the stepping system.
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H. Hasegawa, A. Imai, T. Terasawa, T. Tanaka, F. Murai. The Japan Society of Applied Physics and Related Societies "Extended Abstracts 29p-ZC-3, Submicron Lithography Using Phase Mask (9): Halftone Phase Shifting Mask" 1991.
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Lin, Burn J. "The Attenuated Phase-Shifting Mask" Solid State Technology Jan. 1992.
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Dao Giang T.
Hainsey Robert F.
Gellner Michael L.
Intel Corporation
Malley D. P.
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