Process of removing ions from solutions using a complex with sul

Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing

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556418, 556413, 556422, 556423, 556428, 556436, 556437, 5564115, 546 14, 549 4, 549214, 548110, 544229, C07F 708, C07F 710

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054461820

ABSTRACT:
A method for the removal and concentration of desired ions such as Pd(II), Ru(III), Pd(IV), Au(III), Au(I), Ag(I), and Hg(II) from a multiple ion source solution which may contain larger concentrations of other undesired ions including H.sup.+ comprises bringing the source solution into contact with a compound comprising a sulfur and electron withdrawing group containing ligand covalently bonded through an organic spacer silicon grouping to a solid inorganic support. The sulfur and electron withdrawing group containing ligand portion(s) of the compound has an affinity for the desired ions to form a complex thereby removing the desired ions from the source solution. The desired ions are removed from the compound by contacting the compound with a much smaller volume of a receiving solution having a greater affinity for the desired ions than does the sulfur and electron withdrawing group containing ligand portion of the compound. The process is useful in removing desired or unwanted ions from acidic waste streams, metal refining streams, and other industrial or environmental streams. The invention is also drawn to the sulfur and electron withdrawing group containing ligands covalently bonded through a spacer grouping to a hydrophilic inorganic solid support material.

REFERENCES:
patent: 5294622 (1994-03-01), Dreikorn et al.
patent: 5321066 (1994-06-01), Carrozza et al.
patent: 5322953 (1994-06-01), Lee et al.
patent: 5324710 (1994-06-01), Ort et al.

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