Linewidth measurement method and apparatus

Optics: measuring and testing – Angle measuring or angular axial alignment – With photodetection remote from measured angle

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Details

356157, 356204, G01B 1102, G01B 1128, G01N 2122

Patent

active

040508218

ABSTRACT:
Very rapid and accurate linewidth measurements in selected subregions of an LSI mask or wafer are made by means of a low-cost apparatus. The apparatus embodies the recognition that an accurate linewidth determination can be made for any particular feature among a variety of features in a repeated array by a calibrated and normalized measurement of the average light transmission or reflection of a subregion that includes the feature. In turn, the measurement is automatically converted to a linewidth reading by analog computing circuitry.

REFERENCES:
patent: 2939361 (1960-06-01), Hock
patent: 3645811 (1972-02-01), Davis et al.
patent: 3669771 (1972-06-01), Lerner et al.
patent: 3740152 (1973-06-01), Iisuka
Bojman, W., "Detection and/or Measurement on Complex Patterns", IBM Tech. Disc. Bull., vol. 13, 11-1970, pp. 1429-1430.

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