Simultaneous dehydration and removal of residual impurities from

Details Simultaneous dehydration and removal of residual impurities from Simultaneous dehydration and removal of residual impurities from

1991-01-22

1992-06-09

Niebling, John

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

55 35, 55 75, 423230, B01D 5302, B01D 5314

Patent

active

051205157

ABSTRACT:
The present invention advantageously provides a conventional dessicant bed with means for removing residual mercury, H.sub.2 S and CO.sub.2 from a gas, such as a natural gas stream, by replacing an inert protective layer of pellets with an active compound comprising at least one of copper hydroxide, copper oxide and copper sulfide. The active compound provides the dessicant bed with the additional advantage of removing H.sub.2 S and CO.sub.2 as well as mercury from the gaseous fraction without incurring the pressure loss inherent in utilizing a separate downstream adsorbent bed for removing Hg.

REFERENCES:
patent: 4094777 (1978-06-01), Sugier et al.
patent: 4251495 (1981-02-01), Deschamps et al.
patent: 4834953 (1989-05-01), Audeh
patent: 4874525 (1989-10-01), Markovs
patent: 4895708 (1990-01-01), Yan
patent: 4902662 (1990-02-01), Toulhoat et al.
patent: 4982050 (1991-01-01), Gammie et al.
patent: 4983277 (1991-01-01), Audeh et al.

Affiliated with

Also associated with

Rating

Simultaneous dehydration and removal of residual impurities from does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Simultaneous dehydration and removal of residual impurities from, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Simultaneous dehydration and removal of residual impurities from will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1803240