Electron sources and equipment having electron sources

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 13, 357 4, 357 88, 357 90, H01L 2934

Patent

active

045161461

ABSTRACT:
An electron source having a rapid response time comprises at least one n-p-n structure (and possibly an array of said n-p-n structure) formed in a silicon or other semiconductor body (10) by a p-type first region (1) between n-type second and third regions (2 and 3). Electrons (24) are generated in the n-p-n structure (2,1,3) for emission into free space (20) from a surface area (4) of the body (10) after flowing from the second region (2) through the first and third regions (1 and 3). The n-p-n structure (2,1,3) has electrode connections (12 and 13) only to the n-type second and third regions (2 and 3). The first region (1) provides a barrier region restricting the flow of electrons from the second region (2) to the third region (3) until a potential difference (V) is applied between the electrode connections (12 and 13) to bias the third region (3) positive with respect to the second region (2) and to establish a supply of hot electrons (24) injected into the third region (3) with sufficient energy to overcome the potential barrier present between the surface area (4) and free space (20). The barrier region (1) forms depletion layers with both the n-type second and third regions (2 and b 3) and is depleted of holes by the merging together of these depletion layers at least when the potential difference (V) is applied to establish said supply of hot electrons (24). The n-p-n structure can be provided in a mesa portion (9) of the body (10) at a window in an insulating layer (11) so as to form a compact arrangement having very low associated capacitances. The electron sources may be used in cathode-ray tubes, display devices and even electron lithography equipment.

REFERENCES:
patent: 2960659 (1960-11-01), Burton
patent: 3931633 (1976-01-01), Shannon
patent: 4000503 (1976-12-01), Matare
patent: 4015284 (1977-03-01), Hara
patent: 4259678 (1981-03-01), Van Gorkom
patent: 4303930 (1981-12-01), Van Gorkom
patent: 4352117 (1982-09-01), Cuomo

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electron sources and equipment having electron sources does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron sources and equipment having electron sources, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron sources and equipment having electron sources will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1803021

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.