Process for forming silicide plugs in semiconductor devices

Fishing – trapping – and vermin destroying

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437203, 148 19, H01L 2144

Patent

active

057007225

ABSTRACT:
A process for forming a uniform silicide plug inside an opening in a semiconductor to form fine contacts is disclosed wherein a silicon based material which is inserted into a hole formed in a substrate is reacted with a metal layer to form the contacts.

REFERENCES:
patent: Re32613 (1988-02-01), Lepselter et al.
patent: 4647361 (1987-03-01), Bauer
patent: 4818723 (1989-04-01), Yen
patent: 4966868 (1990-10-01), Murali et al.
Wolf et al., vol. II, Silicon Processing for the VLSI Era, Lattice Press, 1990.

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