Ion chamber for electron-bombardment ion sources

Details Ion chamber for electron-bombardment ion sources Ion chamber for electron-bombardment ion sources

1982-07-14

1985-05-07

Boudreau, Leo H.

Electric lamp and discharge devices

With positive or negative ion acceleration

3133621, 313154, 313155, 60202, H01J 150, H05H 100

Patent

active

045160503

ABSTRACT:
A multipole electron-bombardment type ion source includes an ion chamber defined by chamber walls and magnetic elements of an electrically insulating, permanently magnetized material. The magnetic elements provide mechanical support for anode elements and electrically isolate the anode elements from the chamber walls. In a preferred embodiment, the magnetic elements and the anode elements form a layered structure.

REFERENCES:
patent: 3156090 (1964-11-01), Kaufman
patent: 3969646 (1976-07-01), Reader et al.
patent: 4126781 (1978-11-01), Siegel
patent: 4158589 (1979-06-01), Keller et al.
patent: 4259145 (1981-03-01), Harper et al.
patent: 4277939 (1981-06-01), Hyman, Jr.
Ramsey, "12-cm Magneto-Electrostatic Containment Mercury Ion Thruster Development," J. Spacecraft and Rockets, vol. 9, pp. 318-321, (1972).
Kaufman et al., "Ion Sources for Machining Applications," AIAA Paper No. 76-1014, (1976).
Reader et al., "Optimization of an Electron-Bombardment Ion Source for Ion Machining Applications," J. Vac. Sci. Technol., vol. 12, No. 6, Nov./Dec. 1975.
Issacson et al., "15-cm Multipole Gas Ion Thruster," AIAA Paper No. 76-1045, (1976).
Ion Tech, Inc. data sheet, "2.5 cm (Standard or High Power), 10 cm and 15 cm Ion Sources," date unknown.

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