Positive type 1,2-naphthoquinonediazide photoresist composition

Details Positive type 1,2-naphthoquinonediazide photoresist composition Positive type 1,2-naphthoquinonediazide photoresist composition

1993-06-03

1994-11-01

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430512, G03F 7023, G03C 161

Patent

active

053606922

ABSTRACT:
There is disclosed a positive type photoresist composition comprising an alkali-soluble resin, a compound having a 1,2-naphthoquinonediazido group, and at least one light absorbing agent selected from the group consisting of the compounds represented by the following formulae [I] and [II], the content of said light absorbing agent being in the range of 0.1 to 10% by weight based on the total solid content of the composition: ##STR1## wherein X represents a hydrogen atom, a halogen atom, an alkyl group, an aralkyl group, an alkoxy group, an acyl group, or an aryl group; Y represents a single bond, an alkylene group, --O--, --S--, --SO.sub.2 --or ##STR2## R represents a hydrogen atom, an alkyl group, or an aralkyl group; m represents an integer from 1 to 3; and n represents an integer from 1 to 4. The content of light absorbing agent in said composition is in the range of from 0.3% by weight to 5% by weight, based on the total solid content of the composition.

REFERENCES:
patent: 3661582 (1972-05-01), Broyde
patent: 3936305 (1976-02-01), Hiraishi et al.
patent: 4681905 (1987-07-01), Kubota et al.
patent: 4937348 (1990-06-01), Kubota
patent: 4952664 (1990-08-01), Masumoto et al.
patent: 5215858 (1993-06-01), Koibuchi et al.

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