Exposure control mechanism

Details Exposure control mechanism Exposure control mechanism

1984-05-18

1985-05-07

Perkey, William B.

354228, 3542671, G03B 7097, G03B 900

Patent

active

045154570

ABSTRACT:
In a camera of the type having (a) an adjustable diaphragm for reducing the effective size of an exposure aperture and (b) a shutter including an opening blade for uncovering the exposure aperture and a closing blade for re-covering the exposure aperture, a single electromagnet is used in conjunction with an ambient light-regulated circuit to control the diaphragm and the shutter in relation to the intensity of ambient light. The electromagnet is energized only once for each film exposure, at alternative times corresponding to relatively dim and relatively bright ambient light. During dim light, the electromagnet is energized before the diaphragm can reduce the effective size of the exposure aperture, to retain the diaphragm with the closing blade removed from the exposure aperture during shutter opening. During bright light, the electromagnet is energized after the diaphragm reduces the effective size of the exposure aperture, to retain only the closing blade during shutter opening at the smaller size aperture. De-energization of the electromagnet releases the closing blade (and the diaphragm, if it is retained) to permit shutter closing.
Such use of the electromagnet, only once for each film exposure, requires less current drain on a camera battery as compared to prior art devices, and therefore is a more efficient use of the electromagnet.

REFERENCES:
patent: 3068770 (1962-12-01), Bing
patent: 3385187 (1968-05-01), Bestenreiner
patent: 3718079 (1973-02-01), Fuller
patent: 3916425 (1975-10-01), Tanaka
patent: 4059836 (1977-11-01), Hochreiter et al.
patent: 4324463 (1982-04-01), Lermann et al.

Affiliated with

Also associated with

Rating

Exposure control mechanism does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure control mechanism, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure control mechanism will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1796598